Investigation of Ultratrace Metallic and Organic Contaminants in Semiconductor Processing Environments
Description: Detection of ultratrace levels of metallic ion impurities in hydrofluoric acid solutions and alkaline hydrogen peroxide solution was demonstrated using a silicon-based sensing electrode. The sensor's operation principle is based on direct measurements of the silicon open-circuit potential shift generated by the interaction between metallic ions and the silicon-based sensing surface. The new sensor can have practical applications in the on-line monitoring of microelectronic chemical processing. The detection of Ag+ content in KODAK waste water was carried out successfully by this novel sensor. Trace levels of organic impurities in the hydrofluoric acid solutions and in the cleanroom air were characterized by multiple internal reflection infrared spectroscopy (MIRIS) using an organics probe prepared directly from a regular silicon wafer.
Date: May 1997
Creator: Xu, Fei, 1971-
Partner: UNT Libraries