Description: Plasma cleaning is the most effective dry process to remove surface contaminates from a SAW (Surface Acoustical Wave) device. Consistent gas pressures, flows, and good electrical connections between the chamber shelves are necessary for the process to function predictably. In addition, operation of the monitoring system must be transparent to the plasma cleaning unit. This thesis describes a simple solution to the complex problem of monitoring a plasma cleaning system. The monitoring system uses the LabVIEW® G programming language and hardware, both products of National Instruments, Inc.®, to monitor critical parameters necessary to achieve a consistent process when cleaning these devices.
Date: May 1999
Creator: Fooks, Terry M. (Terry Max)
Partner: UNT Libraries