UNT Theses and Dissertations - 5 Matching Results

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Computer Simulations of Dilute Polymer Solutions: Chain Overlaps and Entanglements

Description: Chain conformations and the presence of chain overlaps and entanglements in dilute polymer solutions have been analyzed. The fundamental problem of existence of chain overlaps in dilute solutions is related to the drag reduction phenomenon (DR). Even though DR occurs in solutions with the concentration of only few parts per million (ppm), some theories suggest that entanglements may play an important role in DR mechanism. Brownian dynamics technique have been used to perform simulations of dilute polymer solutions at rest and under shear flow. A measure of interchain contacts and two different measures of entanglements have been devised to evaluate the structure of polymer chains in solution. Simulation results have shown that overlaps and entanglements do exist in static dilute solutions as well as in solutions under shear flow. The effect of solution concentration, shear rate and molecular mass have been examined. In agreement with the solvation theory of DR mechanism, simulation results have demonstrated the importance of polymer + polymer interactions in dilute solutions.
Date: August 1996
Creator: Drewniak, Marta
Partner: UNT Libraries

Kinetic Studies of the Reactions of Alkyl and Silyl Hydrides

Description: The Kinetics of the reactions involving alkyl and silyl hydrides were studied by the flash photolysis / resonance fluorescence technique. The reactions of alkyl radicals (R = C₂H₅, i-C₃H₇, t-C₄H₉) with HBr have been studied at room temperature and the rate constants obtained (units are in cm³ s^-1 ) are: k₃.₃ = (7.01 ± 0.15) x 10^-12, k₃.₂ = (1.25 ± 0.06) x 10^-11, k₃.₁ = (2.67 ± 0.13) x 10^-11 These results, combined with previously determined reverse rate constants and other kinetic information, yield bond dissociation enthalpies (units in kJ mol^-1) at 298 K : primary C-H in C₂H₅-H (423.6 ± 2), secondary C-H in i-C₃H₇-H (409.9 ± 2), tertiary C-H in t-C₄H₉-H (405.1 ± 2). These rate constants and bond energies are in good agreement with previous results.
Date: August 1996
Creator: Yuan, Jessie (Jessie Win-Jae)
Partner: UNT Libraries

A Materials Approach to Silicon Wafer Level Contamination Issues from the Wet Clean Process

Description: Semiconductor devices are built using hyperpure silicon and very controlled levels of doping to create desired electrical properties. Contamination can alter these precisely controlled electrical properties that can render the device non-functional or unreliable. It is desirable to determine what impurities impact the device and control them. This study consists of four parts: a) determination of acceptable SCI (Standard Clean 1) bath contamination levels using VPD-DSE-GFAAS (Vapor Phase Decomposition Droplet Surface Etching Graphite Furnace Atomic Absorption Spectroscopy), b) copper deposition from various aqueous HF solutions, c) anion contamination from fluoropolymers used in chemical handling and d) metallic contamination from fluoropolymers and polyethylene used in chemical handling. A technique was developed for the determination of metals on a silicon wafer source at low levels. These levels were then correlated to contamination levels in a SCI bath. This correlation permits the determination of maximum permissible solution contaminant levels. Copper contamination is a concern for depositing on the wafer surface from hydrofluoric acid solutions. The relationship between copper concentration on the wafer surface and hydrofluoric acid concentration was determined. An inverse relationship exists and was explained by differences in diffusion rates between the differing copper species existing in aqueous hydrofluoric acid solutions. Finally, sources of contamination from materials used in chemical handling was studied. The predominant anion contamination from fluoropolymers was found to be fluorides. Metallic contamination from fluoropolymers and polyethylene was also studied. The primary metal contamination comes from the actual fabrication of the polymer and not from the polymer resin.
Date: December 1996
Creator: Hall, Lindsey H. (Lindsey Harrison)
Partner: UNT Libraries

NMR Study of the Reorientational and Exchange Dynamics of Organometallic Complexes

Description: Investigations presented here are (a) the study of reorientational dynamics and internal rotation in transition metal complexes by NMR relaxation experiments, and (b) the study of ligand exchange dynamics in transition metal complexes by exchange NMR experiments. The phenyl ring rotation in Ru3(CO)9(μ3-CO)(μ3-NPh) and Re(Co)2(CO)10(μ3- CPh) was monitored by 13C NMR relaxation experiments to probe intramolecular electronic and/or steric interactions. It was found that the rotation is relatively free in the first complex, but is restrained in the second one. The steric interactions in the complexes were ascertained by the measurement of the closest approach intramolecular distances. The rotational energy barriers in the two complexes were also calculated by using both the Extended Hiickel and Fenske-Hall methods. The study suggests that the barrier is due mainly to the steric interactions. The exchange NMR study revealed two carbonyl exchange processes in both Ru3(CO)9(μ3-CO)(μ3-NPh) and Ru3(CO)8(PPh3)(μ3-CO)(μ3-NPh). The lower energy process is a tripodal rotation of the terminal carbonyls. The higher energy process, resulting in the exchange between the equatorial and bridging carbonyls, but not between the axial and bridging carbonyls, involves the concerted formation of edge-bridging μ2-CO moieties. The effect of the PPh3 ligand on the carbonyl exchange rates has been discussed. A combination of relaxation and exchange NMR found that PPh3 ligand rotation about the Ru-P bond is slow on the exchange NMR time scale and the phenyl rotation about the P-Cipso bond is fast on the exchange NMR time scale but is slow on the NMR relaxation time scale.
Date: May 1996
Creator: Wang, Dongqing
Partner: UNT Libraries

Part 1. Investigation of Aluminum Amino Acid Complexes; Part 2. Structural Studies of Aluminum Chalcogen Bonds

Description: Five different complexes of aluminum and amino acids have been synthesized and characterized. Reaction between aluminum halides and amino acids that do not contain either a carboxylate or a hydroxy group in the side chain produce complexes of the general formula, [Al(amino acid)_n(halide)_3-n]_m. The most prevalent form of this form of complex is where n = 2, and an example of this in which the halide is replaced by hydroxide ligand has been structurally characterized. The complex for which n = 3 may be obtained by employing a large excess of acid, and that for which n = 1 may be obtained by employing either equimolar conditions or an excess of aluminum halide. Reactions of aluminum halides with amino acids that contain either a carboxylate or hydroxy-containing side chain may result in complexes in which the side-chain is also bound. These proved impossible to characterize fully in the case of aspartic acid. For serine, however, a complex in which the amino acid binds in a chelating fashion through both the carboxylate and hydroxy groups was isolated. It was possible to form complexes when utilizing aluminum alkyls as the metal source. However, these complexes could only be isolated when the reactivity of the species was controlled by the presence of bulky groups. In these cases, the monomeric R_2Al(amino acid) complexes were obtained. Four complexes that contain aluminum-chalcogen bonds were structurally characterized. These included the bulky alkoxide complexes (BHT)_2AIH(OEt_2), (BHT)_3Al(cyclohexanone), and the cubane [(t-amyl)AlS]_4.
Date: May 1996
Creator: Gravelle, Philip W. (Philip Wyn)
Partner: UNT Libraries