Wafer Fabrication Monitoring/Control System and Method

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Description

Patent relating to systems and methods for monitoring and testing patterning processes including etching, cleaning, and depositing of low k and ultra-low k dielectrics for semiconductor technologies.

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31 p. : ill.

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Chen, Jin-Jian & Chyan, Oliver M. R. June 14, 2016.

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This patent is part of the collection entitled: UNT Scholarly Works and was provided by UNT College of Arts and Sciences to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 39 times . More information about this patent can be viewed below.

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Description

Patent relating to systems and methods for monitoring and testing patterning processes including etching, cleaning, and depositing of low k and ultra-low k dielectrics for semiconductor technologies.

Physical Description

31 p. : ill.

Notes

Abstract: A wafer fabrication monitoring/control system and method is disclosed. The invention utilizes Multiple Internal Reflection Infrared Detection (MIR-IR) to provide a highly sensitive (sub-10 nm, in-situ, ex-situ) on-wafer monitoring and characterization apparatus and method. The disclosed system and method has many practical applications to the development of advanced microfabrication technologies for sub-32 nm node CMOS semiconductor devices and provides support for formulation design, photolithographic patterning, etching/ashing of photoresists, plasma reactive ion etching (RIE) for trench/via patterning of low k dielectric, bottom anti-reflective coatings (BARCs), etch stop layers, and minimization/removal of plasma-etch polymers, development/confirmation of wet cleaning formulations and effectiveness for post CMP and post-etch cleaning.

Related U.S. Application Data: Provisional application No. 61/465,154, filed on Mar. 15, 2011.

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UNT Scholarly Works

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Submitted Date

  • March 15, 2012

Accepted Date

  • June 14, 2016

Creation Date

  • June 14, 2016

Added to The UNT Digital Library

  • Aug. 29, 2017, 9:38 a.m.

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Chen, Jin-Jian & Chyan, Oliver M. R. Wafer Fabrication Monitoring/Control System and Method, patent, June 14, 2016; Washington, D.C.. (digital.library.unt.edu/ark:/67531/metadc990998/: accessed September 20, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT College of Arts and Sciences.