Effects of light on the resistivity of chemical vapor deposited graphene films

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Description

This article reports that the resistance of a chemical vapor deposition (CVD) grown graphene film transferred onto an SiO₂ substrate increases to higher saturation values upon exposure to light of decreasing wavelength from the visible to ultraviolet.

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10 p.

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Mo, Yudong; Pérez, José M.; Ye, Zhou; Zhao, Lei; Yang, Shizhong; Tan, Liuxi et al. October 24, 2016.

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This article is part of the collection entitled: UNT Scholarly Works and was provided by UNT College of Arts and Sciences to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 25 times . More information about this article can be viewed below.

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  • AIMS Press
    Place of Publication: Springfield, Missouri

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Description

This article reports that the resistance of a chemical vapor deposition (CVD) grown graphene film transferred onto an SiO₂ substrate increases to higher saturation values upon exposure to light of decreasing wavelength from the visible to ultraviolet.

Physical Description

10 p.

Source

  • AIMS Materials Science, 2016. AIMS Press: Springfield, MO

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Publication Information

  • Publication Title: AIMS Materials Science
  • Volume: 3
  • Issue: 4
  • Pages: 1426-1435
  • Peer Reviewed: Yes

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UNT Scholarly Works

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  • October 24, 2016

Added to The UNT Digital Library

  • Feb. 27, 2017, 9:29 p.m.

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Mo, Yudong; Pérez, José M.; Ye, Zhou; Zhao, Lei; Yang, Shizhong; Tan, Liuxi et al. Effects of light on the resistivity of chemical vapor deposited graphene films, article, October 24, 2016; Springfield, Missouri. (digital.library.unt.edu/ark:/67531/metadc957458/: accessed August 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT College of Arts and Sciences.