High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition

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High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc ... continued below

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Anders, Andre September 1, 2009.

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High power impulse magnetron sputtering (HIPIMS) and related self-sputtering techniques are reviewed from a viewpoint of plasma-based ion implantation and deposition (PBII&D). HIPIMS combines the classical, scalable sputtering technology with pulsed power, which is an elegant way of ionizing the sputtered atoms. Related approaches, such as sustained self-sputtering, are also considered. The resulting intense flux of ions to the substrate consists of a mixture of metal and gas ions when using a process gas, or of metal ions only when using `gasless? or pure self-sputtering. In many respects, processing with HIPIMS plasmas is similar to processing with filtered cathodic arc plasmas, though the former is easier to scale to large areas. Both ion implantation and etching (high bias voltage, without deposition) and thin film deposition (low bias, or bias of low duty cycle) have been demonstrated.

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  • Journal Name: Surface and Coatings Technology

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  • Report No.: LBNL-2550E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 974435
  • Archival Resource Key: ark:/67531/metadc934127

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  • September 1, 2009

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  • Nov. 13, 2016, 7:26 p.m.

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  • Jan. 4, 2017, 3:25 p.m.

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Anders, Andre. High power impulse magnetron sputtering and related discharges: scalable plasma sources for plasma-based ion implantation and deposition, article, September 1, 2009; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc934127/: accessed September 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.