Mask defect verification using actinic inspection and defect mitigation technology

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The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. The successful production of defect-free masks will depend on the timely development of defect inspection tools, including both mask blank inspection tools and absorber pattern inspection tools to meet the 22 nm half-pitch node. EUV mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360 is operated at SEMA TECH's Mask blank Development Center (MBDC) in Albany, with sensitivity to multilayer defects down to 40-45 nm, which ... continued below

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Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Goldberg, Kenneth; Mochi, Iacopo et al. April 14, 2009.

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Description

The availability of defect-free masks remains one of the key challenges for inserting extreme ultraviolet lithography (EUVL) into high volume manufacturing. The successful production of defect-free masks will depend on the timely development of defect inspection tools, including both mask blank inspection tools and absorber pattern inspection tools to meet the 22 nm half-pitch node. EUV mask blanks with embedded phase defects were inspected with a reticle actinic inspection tool (AIT) and the Lasertec M7360. The Lasertec M7360 is operated at SEMA TECH's Mask blank Development Center (MBDC) in Albany, with sensitivity to multilayer defects down to 40-45 nm, which is not likely sufficient for mask blank development below the 32 nm half-pitch node. Phase defect printability was simulated to calculate the required defect sensitivity for the next generation blank inspection tool to support reticle development for the sub-32 nm half-pitch technology node. This paper will also discuss the kind of infrastructure that will be required in the development and mass production stages.

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  • SPIE Advanced Lithography 2009, San Jose, CA, February 23-27, 2009

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  • Report No.: LBNL-1847E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 957054
  • Archival Resource Key: ark:/67531/metadc933597

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • April 14, 2009

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  • Nov. 13, 2016, 7:26 p.m.

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  • Oct. 2, 2017, 5:07 p.m.

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Huh, Sungmin; Kearney, Patrick; Wurm, Stefan; Goodwin, Frank; Goldberg, Kenneth; Mochi, Iacopo et al. Mask defect verification using actinic inspection and defect mitigation technology, article, April 14, 2009; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc933597/: accessed November 17, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.