Influence of Reaction with XeF2 on Surface Adhesion of Al and Al2O3 Surfaces

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The change of surface adhesion after fluorination of Al and Al{sub 2}O{sub 3} surfaces using XeF{sub 2} was investigated with atomic force microscopy. The chemical interaction between XeF{sub 2} and Al and Al{sub 2}O{sub 3} surfaces was studied by in situ x-ray photoelectron spectroscopy. Fresh Al and Al{sub 2}O{sub 3} surfaces were obtained by etching top silicon layers of Si/Al and Si/Al{sub 2}O{sub 3} with XeF{sub 2}. The surface adhesion and chemical composition were measured as a function of time after the exposure to air or annealing (at 200 C under vauum). The correlation between the adhesion force increase and ... continued below

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Zhang, Tianfu; Park, Jeong Y.; Huang, Wenyu & Somorjai, Gabor A. July 28, 2008.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 119 times , with 16 in the last month . More information about this article can be viewed below.

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The change of surface adhesion after fluorination of Al and Al{sub 2}O{sub 3} surfaces using XeF{sub 2} was investigated with atomic force microscopy. The chemical interaction between XeF{sub 2} and Al and Al{sub 2}O{sub 3} surfaces was studied by in situ x-ray photoelectron spectroscopy. Fresh Al and Al{sub 2}O{sub 3} surfaces were obtained by etching top silicon layers of Si/Al and Si/Al{sub 2}O{sub 3} with XeF{sub 2}. The surface adhesion and chemical composition were measured as a function of time after the exposure to air or annealing (at 200 C under vauum). The correlation between the adhesion force increase and presence of AlF{sub 3} on the surface was revealed.

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  • Journal Name: Applied Physics Letters

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  • Report No.: LBNL-1816E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 953776
  • Archival Resource Key: ark:/67531/metadc931499

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • July 28, 2008

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  • Nov. 13, 2016, 7:26 p.m.

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  • Oct. 2, 2017, 5:05 p.m.

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Zhang, Tianfu; Park, Jeong Y.; Huang, Wenyu & Somorjai, Gabor A. Influence of Reaction with XeF2 on Surface Adhesion of Al and Al2O3 Surfaces, article, July 28, 2008; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc931499/: accessed April 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.