Dependence of optical properties and hardness on carbon content in silicon carbonitride films deposited by plasma ion immersion processing technique

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Materials with Si-C-N composition are of great interest due to their remarkable properties such as high hardness and oxidation resistance. In this study amorphous silicon nitride and silicon carbonitride films were deposited on glass, fised silica, and carbon substrates by the plasma immersion ion processing technique. Gas pressure during the deposition was kept around 0.13 Pa (1 mTorr) and S a, N2, Ar, and C2H2 gas mixtures were used. Film hardness, composition, and UV-visible optical absorption were characterized using nanoindentati on, ion beam analysis techniques, and UV-visible spectroscopy, respectively. The films exhibit high transparency in the visible and near UV ... continued below

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14 p.

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Nastasi, Michael Anthony, & Afanasyev, I. V. (Ivan Viktorovich) January 1, 2002.

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Description

Materials with Si-C-N composition are of great interest due to their remarkable properties such as high hardness and oxidation resistance. In this study amorphous silicon nitride and silicon carbonitride films were deposited on glass, fised silica, and carbon substrates by the plasma immersion ion processing technique. Gas pressure during the deposition was kept around 0.13 Pa (1 mTorr) and S a, N2, Ar, and C2H2 gas mixtures were used. Film hardness, composition, and UV-visible optical absorption were characterized using nanoindentati on, ion beam analysis techniques, and UV-visible spectroscopy, respectively. The films exhibit high transparency in the visible and near UV regions. Addition of the carbon to the films causes decrease in the density of the films, as well as decrease in hardness and transparency. These results suggest that in the low energy regime of PTIP the deposition of hard carbon composites with nitrogen and silicon does not take place.

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14 p.

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  • "Submitted to the IBMM2002 13th International Conference on Ion Beam Modification of Materials, Kobe, Japan, September 1-6, 2002"

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  • Report No.: LA-UR-02-5233
  • Grant Number: none
  • Office of Scientific & Technical Information Report Number: 976300
  • Archival Resource Key: ark:/67531/metadc930140

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  • January 1, 2002

Added to The UNT Digital Library

  • Nov. 13, 2016, 7:26 p.m.

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  • Dec. 12, 2016, 6:28 p.m.

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Nastasi, Michael Anthony, & Afanasyev, I. V. (Ivan Viktorovich). Dependence of optical properties and hardness on carbon content in silicon carbonitride films deposited by plasma ion immersion processing technique, article, January 1, 2002; United States. (digital.library.unt.edu/ark:/67531/metadc930140/: accessed October 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.