An Auger Sputter Profiling Study of Nitrogen and Oxygen Ion Implantations in Two Titiaium Alloys

PDF Version Also Available for Download.

Description

Samples of two titanium alloys, Ti-6A1-4V and Ti-15V-3Cr-3Sn-3A1, were ion implanted with a combination of nitrogen (N+) and oxygen (O+). For each alloy, implantation parameters were chosen to give implanted nitrogen concentrations of approximately 10 or 50 atomic percent, from a depth of 100 nanometers to a depth of 400 nanometers. In all but one case, dual energy (200 keV and 90 keV) implantations of nitrogen were used to give a relatively uniform nitrogen concentration to a depth of 300 nanometers. In each case, oxygen was implanted at 35 keV, following the nitrogen implantation, to give an oxygen-enriched region near ... continued below

Physical Description

33

Creation Information

Barton, B. D., Pope, L. E., Wittberg, T. N. July 31, 1989.

Context

This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this report can be viewed below.

Who

People and organizations associated with either the creation of this report or its content.

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this report. Follow the links below to find similar items on the Digital Library.

Description

Samples of two titanium alloys, Ti-6A1-4V and Ti-15V-3Cr-3Sn-3A1, were ion implanted with a combination of nitrogen (N+) and oxygen (O+). For each alloy, implantation parameters were chosen to give implanted nitrogen concentrations of approximately 10 or 50 atomic percent, from a depth of 100 nanometers to a depth of 400 nanometers. In all but one case, dual energy (200 keV and 90 keV) implantations of nitrogen were used to give a relatively uniform nitrogen concentration to a depth of 300 nanometers. In each case, oxygen was implanted at 35 keV, following the nitrogen implantation, to give an oxygen-enriched region near the surface. The implanted samples were then examined by Auger electron spectroscopy (AES) combined with argon ion sputtering. In order to determine the stoichiometry of the nitrogen implanted regions, it was necessary to determine the N (KVV) contribution to the overlapping N (KVV) and Ti (LMM) Auger transitions. It was also necessary to correct for the ion-bombardment-induced compositional changes which have been described in an earlier study of titanium nitride thin films. The corrected AES depth profiles were in good agreement with theoretical predictions.

Physical Description

33

Language

Item Type

Identifier

Unique identifying numbers for this report in the Digital Library or other systems.

  • Report No.: MLM-3591(OP)
  • Grant Number: None
  • Office of Scientific & Technical Information Report Number: 968219
  • Archival Resource Key: ark:/67531/metadc929968

Collections

This report is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this report?

When

Dates and time periods associated with this report.

Creation Date

  • July 31, 1989

Added to The UNT Digital Library

  • Nov. 13, 2016, 7:26 p.m.

Description Last Updated

  • Dec. 6, 2016, 7:08 p.m.

Usage Statistics

When was this report last used?

Yesterday: 0
Past 30 days: 0
Total Uses: 1

Interact With This Report

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

Citations, Rights, Re-Use

Barton, B. D., Pope, L. E., Wittberg, T. N. An Auger Sputter Profiling Study of Nitrogen and Oxygen Ion Implantations in Two Titiaium Alloys, report, July 31, 1989; United States. (digital.library.unt.edu/ark:/67531/metadc929968/: accessed October 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.