Carbon contamination of extreme ultraviolet (EUV) mask and its effect on imaging

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Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations ... continued below

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Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Garg, Rashi; Thomas, Petros; Mbanaso, Chimaobi et al. February 2, 2009.

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Carbon contamination of extreme ultraviolet (EUV) masks and its effect on imaging is a significant issue due to lowered throughput and potential effects on imaging performance. In this work, a series of carbon contamination experiments were performed on a patterned EUV mask. Contaminated features were then inspected with a reticle scanning electron microscope (SEM) and printed with the SEMA TECH Berkeley Microfield-Exposure tool (MET) [1]. In addition, the mask was analyzed using the SEMA TECH Berkeley Actinic-Inspection tool (AIT) [2] to determine the effect of carbon contamination on the absorbing features and printing performance. To understand the contamination topography, simulations were performed based on calculated aerial images and resist parameters. With the knowledge of the topography, simulations were then used to predict the effect of other thicknesses of the contamination layer, as well as the imaging performance on printed features.

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  • The international conference on magnetism - ICM 2009, Karlsruhe, Germany, July 26-31, 2009

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  • Report No.: LBNL-460E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 953235
  • Archival Resource Key: ark:/67531/metadc927315

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • February 2, 2009

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  • Nov. 13, 2016, 7:26 p.m.

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  • Oct. 2, 2017, 11:44 a.m.

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Fan, Yu-Jen; Yankulin, Leonid; Antohe, Alin; Garg, Rashi; Thomas, Petros; Mbanaso, Chimaobi et al. Carbon contamination of extreme ultraviolet (EUV) mask and its effect on imaging, article, February 2, 2009; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc927315/: accessed December 16, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.