The beam space charge (- for {bar p}'s) will attract positive ions. In the absence of additional fields (clearing electrodes, e.g.) these ions will be trapped in the beam potential well. The depth of this potential well has been calculated for some geometries relevant for the accumulator.
Publisher Info:
Fermi National Accelerator Laboratory (FNAL), Batavia, IL
Place of Publication:
Batavia, Illinois
Provided By
UNT Libraries Government Documents Department
Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.
Descriptive information to help identify this report.
Follow the links below to find similar items on the Digital Library.
Description
The beam space charge (- for {bar p}'s) will attract positive ions. In the absence of additional fields (clearing electrodes, e.g.) these ions will be trapped in the beam potential well. The depth of this potential well has been calculated for some geometries relevant for the accumulator.
This report is part of the following collection of related materials.
Office of Scientific & Technical Information Technical Reports
Reports, articles and other documents harvested from the Office of Scientific and Technical Information.
Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.
Marriner, J.Ion Trapping in the Accumulator,
report,
February 18, 1985;
Batavia, Illinois.
(digital.library.unt.edu/ark:/67531/metadc926646/:
accessed April 22, 2018),
University of North Texas Libraries, Digital Library, digital.library.unt.edu;
crediting UNT Libraries Government Documents Department.