Approaches to rid cathodic arc plasmas of macro- andnanoparticles: A review

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A major obstacle for the broad application of cathodic arc plasma deposition is the presence of micro- and nanoparticles in the plasma, also often referred to as 'macroparticles'. This paper reviews the formation of macroparticles at cathode spots, their interaction with the arc plasma and substrate, and macroparticle separation and removal from the plasma by various filtering methods. Nineteen variants of filters are discussed, including Aksenov's classic 90{sup o}-duct filter, filters of open architecture, and the concept of stroboscopic filtering.

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Anders, Andre June 1, 1999.

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A major obstacle for the broad application of cathodic arc plasma deposition is the presence of micro- and nanoparticles in the plasma, also often referred to as 'macroparticles'. This paper reviews the formation of macroparticles at cathode spots, their interaction with the arc plasma and substrate, and macroparticle separation and removal from the plasma by various filtering methods. Nineteen variants of filters are discussed, including Aksenov's classic 90{sup o}-duct filter, filters of open architecture, and the concept of stroboscopic filtering.

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  • Journal Name: Surface and Coatings Technology; Journal Volume: 120-121; Related Information: Journal Publication Date: 1999

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  • Report No.: LBNL--42284
  • Grant Number: DE-AC02-05CH11231
  • DOI: 10.1016/S0257-8972(99)00460-0 | External Link
  • Office of Scientific & Technical Information Report Number: 928214
  • Archival Resource Key: ark:/67531/metadc902521

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  • June 1, 1999

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  • Sept. 27, 2016, 1:39 a.m.

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  • Sept. 29, 2016, 7:37 p.m.

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Anders, Andre. Approaches to rid cathodic arc plasmas of macro- andnanoparticles: A review, article, June 1, 1999; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc902521/: accessed December 11, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.