Experiences with Opto-Mechanical Systems that Affect Optical Surfaces at the Sub-Nanometer Level

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Projection optical systems built for Extreme Ultraviolet Lithography (EUVL) demonstrated the ability to produce, support and position reflective optical surfaces for achieving transmitted wavefront errors of 1 nm or less. Principal challenges included optical interferometry, optical manufacturing processes, multi-layer coating technology and opto mechanics. Our group was responsible for designing, building and aligning two different projection optical systems: a full-field, 0.1 NA, four-mirror system for 70 nm features and a small-field, 0.3 NA, two-mirror system for 30 nm features. Other than physical size and configuration, the two systems were very similar in the way they were designed, built and aligned. ... continued below

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8 p. (0.4 MB)

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Hale, L C & Taylor, J S April 3, 2008.

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Description

Projection optical systems built for Extreme Ultraviolet Lithography (EUVL) demonstrated the ability to produce, support and position reflective optical surfaces for achieving transmitted wavefront errors of 1 nm or less. Principal challenges included optical interferometry, optical manufacturing processes, multi-layer coating technology and opto mechanics. Our group was responsible for designing, building and aligning two different projection optical systems: a full-field, 0.1 NA, four-mirror system for 70 nm features and a small-field, 0.3 NA, two-mirror system for 30 nm features. Other than physical size and configuration, the two systems were very similar in the way they were designed, built and aligned. A key difference exists in the optic mounts, driven primarily by constraints from the metrology equipment used by different optics manufacturers. As mechanical stability and deterministic position control of optics will continue to play an essential role in future systems, we focus our discussion on opto-mechanics and primarily the optic mounts.

Physical Description

8 p. (0.4 MB)

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PDF-file: 8 pages; size: 0.4 Mbytes

Source

  • Presented at: Precision Mechanical Design and Mechatronics for Sub-50 nm Semiconductor Equipment; 2008 Spring Topical Meeting for the American Society for Precision Engineering, Berkeley, CA, United States, Apr 07 - Apr 08, 2008

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  • Report No.: LLNL-CONF-402688
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 928544
  • Archival Resource Key: ark:/67531/metadc900362

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  • April 3, 2008

Added to The UNT Digital Library

  • Sept. 27, 2016, 1:39 a.m.

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  • April 17, 2017, 1:10 p.m.

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Hale, L C & Taylor, J S. Experiences with Opto-Mechanical Systems that Affect Optical Surfaces at the Sub-Nanometer Level, article, April 3, 2008; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc900362/: accessed September 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.