Spatial scaling metrics of mask-induced induced line-edge roughness

PDF Version Also Available for Download.

Description

Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22-nm production node. Problems arise from mask absorber LER as well as mask reflector or surface roughness leading to random phase variations in the reflected beam. Not only do these mask contributors effect to total measured LER in resist, but they also effect LER spatial characteristic such as the LER power spectral density and related descriptors of correlation length and roughness exponent. Noting that these characteristics are ... continued below

Physical Description

23

Creation Information

Naulleau, Patrick P. & Gallatin, Gregg September 5, 2008.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

Mask contributors to line-edge roughness (LER) have recently been shown to be an issue of concern for both the accuracy of current resist evaluation tests as well the ultimate LER requirements for the 22-nm production node. Problems arise from mask absorber LER as well as mask reflector or surface roughness leading to random phase variations in the reflected beam. Not only do these mask contributors effect to total measured LER in resist, but they also effect LER spatial characteristic such as the LER power spectral density and related descriptors of correlation length and roughness exponent. Noting that these characteristics are important in the understanding of LER, it is crucial to understand how mask effects impact these parameters. Moreover, understanding how these metrics respond to mask effects may lead to an experimental mechanism for experimentally evaluating the importance of mask contributors to LER. Here we use computer modeling to study the LER spatial metrics arising from mask effects. We further describe the effects of illumination conditions and defocus on the metrics and compare the results to those expected from intrinsic resist LER.

Physical Description

23

Source

  • Journal Name: Journal of Vacuum Science and Technology B

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Report No.: LBNL-992E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 940775
  • Archival Resource Key: ark:/67531/metadc898942

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • September 5, 2008

Added to The UNT Digital Library

  • Sept. 27, 2016, 1:39 a.m.

Description Last Updated

  • Oct. 2, 2017, 5:37 p.m.

Usage Statistics

When was this article last used?

Congratulations! It looks like you are the first person to view this item online.

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

International Image Interoperability Framework

IIF Logo

We support the IIIF Presentation API

Naulleau, Patrick P. & Gallatin, Gregg. Spatial scaling metrics of mask-induced induced line-edge roughness, article, September 5, 2008; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc898942/: accessed September 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.