SEMATECH EUV resist benchmarking results Page: 3 of 21
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Extreme Ultraviolet Lithography (EUVL) is one of the
eating candidates for next generation li thography
technology for the 32 nm HP and beyond.
The availability of EUV resists is one of the most
significant challenges facing its cormmnercialization.
To accelerate EUV resist development, SEMATECH
provides access to two exposure tools:
The EUV Resist Test Center (RTC)at SEMATECH at
the University at Albany, SUNYNY
The SEMATECH microexposure tool (ALS-,MET) at
Lawrence Berkeley National Laboratory (LBNL).
SThe results in this report were colected on the
SIEMATECH Berkeley MET.
EUVLSyrnpos ur 2007 10130I207- Page 3 -Accelerating the next technology revolution.
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Ma, Andy; Park, Joo-On; Dean, Kim; Wurm, Stefan & Naulleau, Patrick. SEMATECH EUV resist benchmarking results, article, October 27, 2007; United States. (digital.library.unt.edu/ark:/67531/metadc897060/m1/3/: accessed January 19, 2019), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.