Optics and multilayer coatings for EUVL systems

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Description

EUV lithography (EUVL) employs illumination wavelengths around 13.5 nm, and in many aspects it is considered an extension of optical lithography, which is used for the high-volume manufacturing (HVM) of today's microprocessors. The EUV wavelength of illumination dictates the use of reflective optical elements (mirrors) as opposed to the refractive lenses used in conventional lithographic systems. Thus, EUVL tools are based on all-reflective concepts: they use multilayer (ML) coated optics for their illumination and projection systems, and they have a ML-coated reflective mask.

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PDF-file: 64 pages; size: 2.4 Mbytes

Creation Information

Soufli, R.; Bajt, S.; Hudyma, R. M. & Taylor, J. S. March 21, 2008.

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Description

EUV lithography (EUVL) employs illumination wavelengths around 13.5 nm, and in many aspects it is considered an extension of optical lithography, which is used for the high-volume manufacturing (HVM) of today's microprocessors. The EUV wavelength of illumination dictates the use of reflective optical elements (mirrors) as opposed to the refractive lenses used in conventional lithographic systems. Thus, EUVL tools are based on all-reflective concepts: they use multilayer (ML) coated optics for their illumination and projection systems, and they have a ML-coated reflective mask.

Physical Description

PDF-file: 64 pages; size: 2.4 Mbytes

Source

  • EUV Lithography, Optics and multilayer coatings for EUVL systems, SPIE Press, Bellingham, WA 2008, pp. 133-203

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  • Report No.: LLNL-BOOK-403314
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 945130
  • Archival Resource Key: ark:/67531/metadc895843

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • March 21, 2008

Added to The UNT Digital Library

  • Sept. 27, 2016, 1:39 a.m.

Description Last Updated

  • Oct. 7, 2016, 5:44 p.m.

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Soufli, R.; Bajt, S.; Hudyma, R. M. & Taylor, J. S. Optics and multilayer coatings for EUVL systems, book, March 21, 2008; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc895843/: accessed September 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.