The Effectiveness of HCl and HF Cleaning of Si0.85Ge0.15 Surface

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The cleaning of Si{sub 0.85}Ge{sub 0.15} surfaces using HCl and HF solutions is studied using synchrotron radiation photoelectron spectroscopy. The HF solution is found to be effective in removing both the Si oxide and the Ge oxide while the HCl solution can only remove part of the Ge oxide. For samples treated with HF, four spectral components are needed to fit the Ge 3d photoemission spectra. One is the bulk component and the other three are attributed to the surface Ge atoms with mono-hydride, di-hydride and tri-hydride terminations, respectively.

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Sun, Y.; Liu, Z.; Sun, S. & Pianetta, P. July 11, 2008.

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The cleaning of Si{sub 0.85}Ge{sub 0.15} surfaces using HCl and HF solutions is studied using synchrotron radiation photoelectron spectroscopy. The HF solution is found to be effective in removing both the Si oxide and the Ge oxide while the HCl solution can only remove part of the Ge oxide. For samples treated with HF, four spectral components are needed to fit the Ge 3d photoemission spectra. One is the bulk component and the other three are attributed to the surface Ge atoms with mono-hydride, di-hydride and tri-hydride terminations, respectively.

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  • Journal Name: J.Vac.Sci.Technol.A Vac.Surf.Films 26:1248,2008

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  • Report No.: SLAC-PUB-13302
  • Grant Number: AC02-76SF00515
  • DOI: 10.1116/1.2907782 | External Link
  • Office of Scientific & Technical Information Report Number: 934738
  • Archival Resource Key: ark:/67531/metadc894659

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  • July 11, 2008

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  • Sept. 27, 2016, 1:39 a.m.

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  • Nov. 23, 2016, 5:25 p.m.

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Sun, Y.; Liu, Z.; Sun, S. & Pianetta, P. The Effectiveness of HCl and HF Cleaning of Si0.85Ge0.15 Surface, article, July 11, 2008; [Menlo Park, California]. (digital.library.unt.edu/ark:/67531/metadc894659/: accessed September 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.