Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective

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Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved ... continued below

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Anders, Andre February 28, 2007.

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Deposition of films using plasma or plasma-assist can betraced back surprisingly far, namely to the 18th century for arcs and tothe 19th century for sputtering. However, only since the 1960s thecoatings community considered other processes than evaporation for largescale commercial use. Ion Plating was perhaps the first importantprocess, introducing vapor ionization and substrate bias to generate abeam of ions arriving on the surface of the growing film. Ratherindependently, cathodic arc deposition was established as an energeticcondensation process, first in the former Soviet Union in the 1970s, andin the 1980s in the Western Hemisphere. About a dozen various ion-basedcoating technologies evolved in the last decades, all characterized byspecific plasma or ion generation processes. Gridded and gridless ionsources were taken from space propulsion and applied to thin filmdeposition. Modeling and simulation have helped to make plasma and ionseffects to be reasonably well understood. Yet--due to the complex, oftennon-linear and non-equilibrium nature of plasma and surfaceinteractions--there is still a place for the experience plasma"sourcerer."

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  • 50th Technical Annual Meeting of the Society ofVacuum Coaters, Louisville, Kentucky, April 28-May 3,2007

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  • Report No.: LBNL--61903
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 923009
  • Archival Resource Key: ark:/67531/metadc894543

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  • February 28, 2007

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  • Sept. 27, 2016, 1:39 a.m.

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  • Sept. 30, 2016, 3:56 p.m.

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Anders, Andre. Plasma and Ion Assistance in Physical Vapor Deposition: AHistorical Perspective, article, February 28, 2007; (digital.library.unt.edu/ark:/67531/metadc894543/: accessed August 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.