Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics

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The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.

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Salmassi, Farhad; Gullikson, Eric M.; Anderson, Erik H. & Naulleau, Patrick P. May 1, 2007.

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The use of phase-only diffractive devices has long played an important role in advanced optical systems in varying fields. Such devices include gratings, diffractive and holographic optical elements, diffractive lenses, and phase-shift masks for advanced lithography. Extending such devices to the increasingly important regime of extreme ultraviolet (EUV) wavelengths, however, is not trivial. Here, we present an effective fabrication and etch process enabling high-resolution patterning of Mo/Si multilayers for use in EUV phase devices, providing another method for fabrication of high numerical aperture diffractive devices or high-resolution EUV phase shift masks.

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  • Journal Name: Journal of Vacuum Science and Technology B; Journal Volume: 25; Journal Issue: 6; Related Information: Journal Publication Date: 11/2007

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  • Report No.: LBNL--63272
  • Grant Number: DE-AC02-05CH11231
  • DOI: 10.1116/1.2798725 | External Link
  • Office of Scientific & Technical Information Report Number: 923472
  • Archival Resource Key: ark:/67531/metadc894536

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  • May 1, 2007

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  • Sept. 27, 2016, 1:39 a.m.

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  • Oct. 31, 2016, 3:55 p.m.

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Salmassi, Farhad; Gullikson, Eric M.; Anderson, Erik H. & Naulleau, Patrick P. Multilayer Phase-Only Diffraction Gratings: Fabrication andApplication to EUV Optics, article, May 1, 2007; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc894536/: accessed April 22, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.