Fabrication and characterization of a new high density Sc/Si multilayer sliced grating

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State of the art soft x-ray spectroscopy techniques like Resonant Inelastic X-ray Scattering (RIXS) require diffraction gratings which can provide extremely high spectral resolution of 105-106. This problem may be addressed with a sliced multilayer grating with an ultra-high groove density (up to 50,000 mm-1) proposed in the recent publication [Voronov, D. L., Cambie, R., Feshchenko, R. M., Gullikson, E., Padmore, H. A., Vinogradov, A. V., Yashchuk, V. V., Proc. SPIE 6705, 67050E (2007)]. It has been suggested to fabricate such a grating by deposition of a soft x-ray multilayer on a substrate which is a blazed saw-tooth grating (echellette) ... continued below

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Source, Advanced Light; Voronov, Dmitriy L.; Cambie, Rossana; Gullikson, Eric; Yashchuk, Valeriy; Padmore, Howard et al. July 21, 2008.

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State of the art soft x-ray spectroscopy techniques like Resonant Inelastic X-ray Scattering (RIXS) require diffraction gratings which can provide extremely high spectral resolution of 105-106. This problem may be addressed with a sliced multilayer grating with an ultra-high groove density (up to 50,000 mm-1) proposed in the recent publication [Voronov, D. L., Cambie, R., Feshchenko, R. M., Gullikson, E., Padmore, H. A., Vinogradov, A. V., Yashchuk, V. V., Proc. SPIE 6705, 67050E (2007)]. It has been suggested to fabricate such a grating by deposition of a soft x-ray multilayer on a substrate which is a blazed saw-tooth grating (echellette) with low groove density. Subsequent polishing applied to the coated grating removes part of the coating and forms an oblique-cut multiline structure that is a sliced multilayer grating. The resulting grating has a short-scale periodicity of lines (bilayers), which is defined by the multilayer period and the oblique-cut angle. We fabricated and tested a Sc/Si multilayer sliced grating suitable for EUV applications, which is a first prototype based on the suggested technique. In order to fabricate an echellette substrate, we used anisotropic KOH etching of a Si wafer. The etching regime was optimized to obtain smooth and flat echellette facets. A Sc/Si multilayer was deposited by dc-magnetron sputtering, and after that it was mechanically polished using a number of diamond pastes. The resulting sliced grating prototype with ~;;270 nm line period has demonstrated a dispersive ability in the 41-49 nm photon wavelength range with a diffraction efficiency of ~;;7percent for the optimized 38th order assigned to the echellette grating of 10 mu m period.

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  • SPIE Optics and Photonics 2008, Conference 7077: Advancesin X-Ray/EUV Optics and Components III, San Diego, CA, 11-13 August 2008

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  • Report No.: LBNL-126E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 940559
  • Archival Resource Key: ark:/67531/metadc893947

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  • July 21, 2008

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  • Sept. 27, 2016, 1:39 a.m.

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  • Jan. 4, 2017, 3:33 p.m.

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Source, Advanced Light; Voronov, Dmitriy L.; Cambie, Rossana; Gullikson, Eric; Yashchuk, Valeriy; Padmore, Howard et al. Fabrication and characterization of a new high density Sc/Si multilayer sliced grating, article, July 21, 2008; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc893947/: accessed August 17, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.