Investigation of the Millimeter-Wave Plasma Assisted CVD Reactor

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A polycrystalline diamond grown by the chemical vapor deposition (CVD) technique is recognized as a unique material for high power electronic devices owing to unrivaled combination of properties such as ultra-low microwave absorption, high thermal conductivity, high mechanical strength and chemical stability. Microwave vacuum windows for modern high power sources and transmission lines operating at the megawatt power level require high quality diamond disks with a diameter of several centimeters and a thickness of a few millimeters. The microwave plasma-assisted CVD technique exploited today to produce such disks has low deposition rate, which limits the availability of large size diamond ... continued below

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Vikharev, A; Gorbachev, A; Kozlov, A; Litvak, A; Bykov, Y & Caplan, M July 21, 2005.

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A polycrystalline diamond grown by the chemical vapor deposition (CVD) technique is recognized as a unique material for high power electronic devices owing to unrivaled combination of properties such as ultra-low microwave absorption, high thermal conductivity, high mechanical strength and chemical stability. Microwave vacuum windows for modern high power sources and transmission lines operating at the megawatt power level require high quality diamond disks with a diameter of several centimeters and a thickness of a few millimeters. The microwave plasma-assisted CVD technique exploited today to produce such disks has low deposition rate, which limits the availability of large size diamond disk windows. High-electron-density plasma generated by the millimeter-wave power was suggested for enhanced-growth-rate CVD. In this paper a general description of the 30 GHz gyrotron-based facility is presented. The output radiation of the gyrotron is converted into four wave-beams. Free localized plasma in the shape of a disk with diameter much larger than the wavelength of the radiation is formed in the intersection area of the wave-beams. The results of investigation of the plasma parameters, as well as the first results of diamond film deposition are presented. The prospects for commercially producing vacuum window diamond disks for high power microwave devices at much lower costs and processing times than currently available are outlined.

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  • Report No.: UCRL-JRNL-214103
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 884781
  • Archival Resource Key: ark:/67531/metadc892092

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • July 21, 2005

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  • Sept. 23, 2016, 2:42 p.m.

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  • Dec. 7, 2016, 3:44 p.m.

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Vikharev, A; Gorbachev, A; Kozlov, A; Litvak, A; Bykov, Y & Caplan, M. Investigation of the Millimeter-Wave Plasma Assisted CVD Reactor, article, July 21, 2005; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc892092/: accessed November 18, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.