Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage Page: 4 of 15
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to the base material to protect the substrate from the operating environment. The
metal-containing ta-C films have the potential of being applied in coated metallic bi-
polar plates of PEM fuel cells.
Most of the work on depositing metal-containing amorphous carbon films
involved hydrogenated carbon films. They were produced by several methods such as
reactive magnetron sputtering using a hydrocarbon gas as part of the gas mixture, and
a FCVA operated in hydrocarbon gas environment. However, there are less reports
on the deposition of metal-containing ta-C films. Chen et al. [8] used a FCVA with an
Fe/graphite composite cathode with different Fe content, thereby depositing iron-
containing amorphous carbon (a-C:Fe) films. He suggests that the percentage of sp2-
bonded carbon and the size of the sp2-bonded cluster increases with an increase in the
Fe content.
Monteiro et al. [9] used two miniature FCVA plasma sources for depositing
tungsten-containing and silicon-containing non-hydrogenated ta-C films. The films
are produced by mixing the streams of metal (or silicon) and C ions produced by the
two repetitively pulsed vacuum arc plasma sources operating in synchronous pulsed
mode. The substrate was pulsed biased while the arc sources were operating. The
composition of the films was adjusted by varying the relative duration of the pulse
length from each arc plasma source. They concluded that the corresponding decrease
in hardness was not very significant as the relatively small W or Si content was
increased. Films hardness depended not only on the W content but also on the energy
of condensing energy. The films with W content below 20 at.% were amorphous, and
films consisted then of mixtures of a-WC and a-C. At higher W content, the films
consisted of nanocrystalline WC dispersed in an amorphous carbon matrix. It was
IBMM 2006
4
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Pasaja, Nitisak; Sansongsiri, Sakon; Anders, Andre; Vilaithong,Thiraphat & Intasiri, Sawate. Mo-containing tetrahedral amorphous carbon deposited by dualfiltered cathodic vacuum arc with selective pulsed bias voltage, article, September 10, 2006; United States. (https://digital.library.unt.edu/ark:/67531/metadc884075/m1/4/: accessed April 23, 2024), University of North Texas Libraries, UNT Digital Library, https://digital.library.unt.edu; crediting UNT Libraries Government Documents Department.