Grain orientation measurement of passivated aluminum interconnectsby x-ray micro diffraction

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The crystallographic orientations of individual grains in apassivated aluminum interconnect line of 0.7-mu m width were investigatedby using an incidentwhite x-ray microbeam at the Advanced Light Source,Berkeley National Laboratory. Intergrain orientation mapping was obtainedwith about 0.05o sensitivity by the micro Laue diffractiontechnique.

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Chang, Chang-Hwan; Valek, B.C.; Padmore,H.A.; MacDowell, A.A.; Celestre, R.; Marieb, T. et al. July 1, 1999.

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The crystallographic orientations of individual grains in apassivated aluminum interconnect line of 0.7-mu m width were investigatedby using an incidentwhite x-ray microbeam at the Advanced Light Source,Berkeley National Laboratory. Intergrain orientation mapping was obtainedwith about 0.05o sensitivity by the micro Laue diffractiontechnique.

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  • X-Ray Microscopy 99, Berkeley, CA,08/01-7/1999

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  • Report No.: LBNL--44707
  • Report No.: LBNL/ALS--43569
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 903359
  • Archival Resource Key: ark:/67531/metadc883207

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  • July 1, 1999

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  • Sept. 22, 2016, 2:13 a.m.

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  • Sept. 30, 2016, 3:44 p.m.

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Chang, Chang-Hwan; Valek, B.C.; Padmore,H.A.; MacDowell, A.A.; Celestre, R.; Marieb, T. et al. Grain orientation measurement of passivated aluminum interconnectsby x-ray micro diffraction, article, July 1, 1999; (digital.library.unt.edu/ark:/67531/metadc883207/: accessed August 21, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.