EUV testing of multilayer mirrors: critical issues

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Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above {approx} 5 x 10{sup -7} Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional ... continued below

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Hill, S B; Ermanoski, I; Grantham, S; Tarrio, C; Lucatorto, T B; Madey, T E et al. February 24, 2006.

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Recently, while performing extensive EUV irradiation endurance testing on Ru-capped multilayer mirrors in the presence of elevated partial pressures of water and hydrocarbons, NIST has observed that the amount of EUV-induced damage actually decreases with increasing levels of water vapor above {approx} 5 x 10{sup -7} Torr. It is thought that the admitted water vapor may interact with otherwise stable, condensed carbonaceous species in an UHV vacuum system to increase the background levels of simple gaseous carbon-containing molecules. Some support for this hypothesis was demonstrated by observing the mitigating effect of very small levels of simple hydrocarbons with the intentional introduction of methyl alcohol in addition to the water vapor. It was found that the damage rate decreased by at least an order of magnitude when the partial pressure of methyl alcohol was just one percent of the water partial pressure. These observations indicate that the hydrocarbon components of the vacuum environment under actual testing conditions must be characterized and controlled to 10{sup -11} Torr or better in order to quantify the damage caused by high levels of water vapor. The possible effects of exposure beam size and out-of-band radiation on mirror lifetime testing will also be discussed.

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PDF-file: 11 pages; size: 0.2 Mbytes

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  • Presented at: SPIE Microlithography, San Jose, CA, United States, Feb 19 - Feb 24, 2006

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  • Report No.: UCRL-PROC-219279
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 894751
  • Archival Resource Key: ark:/67531/metadc882059

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • February 24, 2006

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  • Sept. 22, 2016, 2:13 a.m.

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  • Nov. 28, 2016, 1:25 p.m.

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Hill, S B; Ermanoski, I; Grantham, S; Tarrio, C; Lucatorto, T B; Madey, T E et al. EUV testing of multilayer mirrors: critical issues, article, February 24, 2006; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc882059/: accessed November 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.