Extending ion-track lithography to the low-energy ion regime

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Ion tracking and ion-track lithography have been performed almost exclusively using ions with energies near or above the maximum in electronic stopping, which occurs at {approx}1 MeV/amu. In this paper, ion-track lithography using ions with energies well below this maximum is discussed. The results of etching ion tracks created in polycarbonate films by ions with energies just above the anticipated threshold for creating etchable latent tracks with cylindrical geometry have been examined. Low-energy neon and argon ions with 18-60 keV/amu and fluences of {approx}10{sup 8}/cm{sup 2} were used to examine the limits for producing useful, etchable tracks in polycarbonate films. ... continued below

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Musket, R G October 14, 2005.

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Ion tracking and ion-track lithography have been performed almost exclusively using ions with energies near or above the maximum in electronic stopping, which occurs at {approx}1 MeV/amu. In this paper, ion-track lithography using ions with energies well below this maximum is discussed. The results of etching ion tracks created in polycarbonate films by ions with energies just above the anticipated threshold for creating etchable latent tracks with cylindrical geometry have been examined. Low-energy neon and argon ions with 18-60 keV/amu and fluences of {approx}10{sup 8}/cm{sup 2} were used to examine the limits for producing useful, etchable tracks in polycarbonate films. By concentrating on the early stages of etching (i.e., {approx}20 nm < SEM hole diameter < {approx}100 nm), the energy deposition calculated for the incident ion was correlated with the creation of etchable tracks. The experimental results are discussed with regard to the energy losses of the ions in the polycarbonate films and to the formation of continuous latent tracks through the entire thickness of the films. The probability distributions for large-angle scattering events were calculated to assess their importance as a function of ion energy. All these results have significant implications with respect to the threshold for formation of etchable tracks and to the use of low-energy ions for lithographic applications of ion tracking.

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PDF-file: 40 pages; size: 6.4 Mbytes

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  • Journal Name: Journal of Applied Physics, vol. 99, no. 11, June 1, 2006, pp. 114314; Journal Volume: 99; Journal Issue: 11

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  • Report No.: UCRL-JRNL-216250
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 902330
  • Archival Resource Key: ark:/67531/metadc881675

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  • October 14, 2005

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  • Sept. 22, 2016, 2:13 a.m.

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  • Dec. 5, 2016, 3:35 p.m.

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Musket, R G. Extending ion-track lithography to the low-energy ion regime, article, October 14, 2005; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc881675/: accessed September 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.