Physical properties of erbium implanted tungsten oxide filmsdeposited by reactive dual magnetron sputtering

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Amorphous and partially crystalline WO3 thin films wereprepared by reactive dual magnetron sputtering and successively implantedby erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015ions/cm2. The electrical and optical properties were studied as afunction of the film deposition parameters and the ion fluence. Ionimplantation caused a strong decrease of the resistivity, a moderatedecrease of the index of refraction and a moderate increase of theextinction coefficient in the visible and near infrared, while theoptical band gap remained almost unchanged. These effects could belargely ascribed to ion-induced oxygen deficiency. When annealed in air,the already low ... continued below

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Mohamed, Sodky H. & Anders, Andre November 8, 2006.

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Amorphous and partially crystalline WO3 thin films wereprepared by reactive dual magnetron sputtering and successively implantedby erbium ions with a fluence in the range from 7.7 x 1014 to 5 x 1015ions/cm2. The electrical and optical properties were studied as afunction of the film deposition parameters and the ion fluence. Ionimplantation caused a strong decrease of the resistivity, a moderatedecrease of the index of refraction and a moderate increase of theextinction coefficient in the visible and near infrared, while theoptical band gap remained almost unchanged. These effects could belargely ascribed to ion-induced oxygen deficiency. When annealed in air,the already low resistivities of the implanted samples decreased furtherup to 70oC, whereas oxidation, and hence a strong increase of theresistivity, was observed at higher annealing temperatures.

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  • Journal Name: Thin Solid Films; Journal Volume: 515; Related Information: Journal Publication Date: 2007

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  • Report No.: LBNL--62248
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 903504
  • Archival Resource Key: ark:/67531/metadc881392

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Office of Scientific & Technical Information Technical Reports

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  • November 8, 2006

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  • Sept. 22, 2016, 2:13 a.m.

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Mohamed, Sodky H. & Anders, Andre. Physical properties of erbium implanted tungsten oxide filmsdeposited by reactive dual magnetron sputtering, article, November 8, 2006; United States. (digital.library.unt.edu/ark:/67531/metadc881392/: accessed May 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.