Filtered cathodic arc deposition with ion-species-selectivebias

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A dual-cathode arc plasma source was combined with acomputer-controlled bias amplifier such as to synchronize substrate biaswith the pulsed production of plasma. In this way, bias can be applied ina material-selective way. The principle has been applied to the synthesismetal-doped diamond-like carbon films, where the bias was applied andadjusted when the carbon plasma was condensing, and the substrate was atground when the metal was incorporated. In doing so, excessive sputteringby too-energetic metal ions can be avoided while the sp3/sp2 ratio can beadjusted. It is shown that the resistivity of the film can be tuned bythis species-selective bias. The principle can ... continued below

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Anders, Andre; Pasaja, Nitisak; Sansongsiri, Sakon & Lim, SunnieH.N. October 5, 2006.

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A dual-cathode arc plasma source was combined with acomputer-controlled bias amplifier such as to synchronize substrate biaswith the pulsed production of plasma. In this way, bias can be applied ina material-selective way. The principle has been applied to the synthesismetal-doped diamond-like carbon films, where the bias was applied andadjusted when the carbon plasma was condensing, and the substrate was atground when the metal was incorporated. In doing so, excessive sputteringby too-energetic metal ions can be avoided while the sp3/sp2 ratio can beadjusted. It is shown that the resistivity of the film can be tuned bythis species-selective bias. The principle can be extended tomultiple-material plasma sources and complex materials

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  • Journal Name: Review of Scientific Instruments; Journal Volume: 78; Related Information: Journal Publication Date: June 2007

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  • Report No.: LBNL--61733
  • Grant Number: DE-AC02-05CH11231
  • Grant Number: INDUSTRY:LB05001865
  • Office of Scientific & Technical Information Report Number: 919385
  • Archival Resource Key: ark:/67531/metadc879583

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • October 5, 2006

Added to The UNT Digital Library

  • Sept. 22, 2016, 2:13 a.m.

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  • Oct. 3, 2017, 2 p.m.

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Anders, Andre; Pasaja, Nitisak; Sansongsiri, Sakon & Lim, SunnieH.N. Filtered cathodic arc deposition with ion-species-selectivebias, article, October 5, 2006; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc879583/: accessed April 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.