Plasma-based ion implantation and deposition: A review of physics,technology, and applications

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After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification ... continued below

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Pelletier, Jacques & Anders, Andre May 16, 2005.

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After pioneering work in the 1980s, plasma-based ion implantation (PBII) and plasma-based ion implantation and deposition (PBIID) can now be considered mature technologies for surface modification and thin film deposition. This review starts by looking at the historical development and recalling the basic ideas of PBII. Advantages and disadvantages are compared to conventional ion beam implantation and physical vapor deposition for PBII and PBIID, respectively, followed by a summary of the physics of sheath dynamics, plasma and pulse specifications, plasma diagnostics, and process modeling. The review moves on to technology considerations for plasma sources and process reactors. PBII surface modification and PBIID coatings are applied in a wide range of situations. They include the by-now traditional tribological applications of reducing wear and corrosion through the formation of hard, tough, smooth, low-friction and chemically inert phases and coatings, e.g. for engine components. PBII has become viable for the formation of shallow junctions and other applications in microelectronics. More recently, the rapidly growing field of biomaterial synthesis makes used of PBII&D to produce surgical implants, bio- and blood-compatible surfaces and coatings, etc. With limitations, also non-conducting materials such as plastic sheets can be treated. The major interest in PBII processing originates from its flexibility in ion energy (from a few eV up to about 100 keV), and the capability to efficiently treat, or deposit on, large areas, and (within limits) to process non-flat, three-dimensional workpieces, including forming and modifying metastable phases and nanostructures. We use the acronym PBII&D when referring to both implantation and deposition, while PBIID implies that deposition is part of the process.

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  • Journal Name: IEEE Transactions on Plasma Science; Journal Volume: 33; Journal Issue: 6; Related Information: Journal Publication Date: 12/2005

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  • Report No.: LBNL--57610
  • Grant Number: DE-AC02-05CH11231
  • DOI: 10.1109/TPS.2005.860079 | External Link
  • Office of Scientific & Technical Information Report Number: 877327
  • Archival Resource Key: ark:/67531/metadc878230

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • May 16, 2005

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  • Sept. 21, 2016, 2:29 a.m.

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  • Sept. 30, 2016, 2:09 p.m.

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Pelletier, Jacques & Anders, Andre. Plasma-based ion implantation and deposition: A review of physics,technology, and applications, article, May 16, 2005; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc878230/: accessed April 19, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.