Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers

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The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization ... continued below

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PDF-file: 35 pages; size: 2.9 Mbytes

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Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N et al. June 15, 2005.

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The oxidation resistance of protective capping layers for extreme ultraviolet lithography (EUVL) multilayers depends on their microstructure. Differently prepared Ru-capping layers, deposited on Mo/Si EUVL multilayers, were investigated to establish their baseline structural, optical, and surface properties in as-deposited state. The same capping layer structures were then tested for their thermal stability and oxidation resistance. The best performing Ru-capping layer structure was analyzed in detail with transmission electron microscopy (TEM). As compared to other Ru capping layers preparations studied here it is the only one that shows grains with preferential orientation. This information is essential for modeling and performance optimization of EUVL multilayers.

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PDF-file: 35 pages; size: 2.9 Mbytes

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  • Journal Name: Journal of Microlithography, Microfabrication and Microsystems; Journal Volume: 5; Journal Issue: 2

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  • Report No.: UCRL-JRNL-213175
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 883757
  • Archival Resource Key: ark:/67531/metadc876479

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • June 15, 2005

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  • Sept. 21, 2016, 2:29 a.m.

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  • Nov. 30, 2016, 3:07 p.m.

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Bajt, S; Dai, Z; Nelson, E J; Wall, M A; Alameda, J B; Nguyen, N et al. Oxidation resistance and microstructure of Ru-capped extreme ultraviolet lithography multilayers, article, June 15, 2005; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc876479/: accessed October 17, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.