Quantum Efficiency and Topography of Heated and Plasma-Cleaned Copper Photocathode Surfaces

PDF Version Also Available for Download.

Description

We present measurements of photoemission quantum efficiency (QE) for copper photocathodes heated and cleaned by low energy argon and hydrogen ion plasma. The QE and surface roughness parameters were measured before and after processing and surface chemical composition was tracked in-situ with x-ray photoelectron spectroscopy (XPS). Thermal annealing at 230 C was sufficient to improve the QE by 3-4 orders of magnitude, depending on the initial QE. Exposure to residual gas slowly reduced the QE but it was easily restored by argon ion cleaning for a few minutes. XPS showed that the annealing or ion bombardment removed surface water and ... continued below

Physical Description

4 pages

Creation Information

Palmer, Dennis T.; PSD, /Titan; Kirby, R.E.; King, F.K. & /SLAC August 4, 2005.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

We present measurements of photoemission quantum efficiency (QE) for copper photocathodes heated and cleaned by low energy argon and hydrogen ion plasma. The QE and surface roughness parameters were measured before and after processing and surface chemical composition was tracked in-situ with x-ray photoelectron spectroscopy (XPS). Thermal annealing at 230 C was sufficient to improve the QE by 3-4 orders of magnitude, depending on the initial QE. Exposure to residual gas slowly reduced the QE but it was easily restored by argon ion cleaning for a few minutes. XPS showed that the annealing or ion bombardment removed surface water and hydrocarbons.

Physical Description

4 pages

Source

  • Contributed to2005 Particle Accelerator Conference, , 5/16/2005-5/20/2005

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Report No.: SLAC-PUB-11355
  • Grant Number: AC02-76SF00515
  • Office of Scientific & Technical Information Report Number: 878805
  • Archival Resource Key: ark:/67531/metadc874400

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • August 4, 2005

Added to The UNT Digital Library

  • Sept. 21, 2016, 2:29 a.m.

Description Last Updated

  • Nov. 30, 2016, 7:13 p.m.

Usage Statistics

When was this article last used?

Congratulations! It looks like you are the first person to view this item online.

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

Citations, Rights, Re-Use

Palmer, Dennis T.; PSD, /Titan; Kirby, R.E.; King, F.K. & /SLAC. Quantum Efficiency and Topography of Heated and Plasma-Cleaned Copper Photocathode Surfaces, article, August 4, 2005; [Menlo Park, California]. (digital.library.unt.edu/ark:/67531/metadc874400/: accessed August 19, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.