Niobium Oxide Film Deposition Using a High-Density Plasma Source

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Niobium oxide was deposited reactively using a new type of high-density plasma sputter source. The plasma beam used for sputtering is generated remotely and its path to the target defined by the orthogonal locations of two electromagnets: one at the orifice of the plasma tube and the other just beneath the target plane. To accommodate very large batches of substrates, the trade-off between load capacity and deposition rates was evaluated. The effect on deposition rate was determined by moving the plasma source away from the target in one direction and by moving the target assembly away in an orthogonal direction. ... continued below

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10 p. (0.2 MB)

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Chow, R; Schmidt, M; Coombs, A; Anguita, J & Thwaites, M January 27, 2006.

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Niobium oxide was deposited reactively using a new type of high-density plasma sputter source. The plasma beam used for sputtering is generated remotely and its path to the target defined by the orthogonal locations of two electromagnets: one at the orifice of the plasma tube and the other just beneath the target plane. To accommodate very large batches of substrates, the trade-off between load capacity and deposition rates was evaluated. The effect on deposition rate was determined by moving the plasma source away from the target in one direction and by moving the target assembly away in an orthogonal direction. A simple methodology was used to reestablish the reactive deposition rate and oxide quality even when large changes were made to the chamber geometry. Deposition parameters were established to produce nonabsorbing niobium oxide films of about 100- and 350-nm thicknesses. The quality of the niobium oxide films was studied spectroscopically, ellipsometrically, and stoichiometrically.

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10 p. (0.2 MB)

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PDF-file: 10 pages; size: 0.2 Mbytes

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  • Presented at: 49th Annual SVC Technical Conference, Washington, DC, United States, Apr 22 - Apr 27, 2006

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  • Report No.: UCRL-CONF-219431
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 889964
  • Archival Resource Key: ark:/67531/metadc873471

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • January 27, 2006

Added to The UNT Digital Library

  • Sept. 21, 2016, 2:29 a.m.

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  • April 13, 2017, 3:06 p.m.

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Chow, R; Schmidt, M; Coombs, A; Anguita, J & Thwaites, M. Niobium Oxide Film Deposition Using a High-Density Plasma Source, article, January 27, 2006; Livermore, California. (digital.library.unt.edu/ark:/67531/metadc873471/: accessed September 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.