Optics, mask and resist implications on contact CDU

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Description

Mask and condenser roughness plays important in contact CDU. Resist blur drives both dose requirements and mask specs. Correlation methods can be used to measure mask contributions to CDU.

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23

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Naulleau, Patrick June 1, 2010.

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Description

Mask and condenser roughness plays important in contact CDU. Resist blur drives both dose requirements and mask specs. Correlation methods can be used to measure mask contributions to CDU.

Physical Description

23

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  • 2010 International Workshop on EUV Lithography, Maui, Hawaii, June 21-25, 2010

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  • Report No.: LBNL-4058E
  • Grant Number: DE-AC02-05CH11231
  • Office of Scientific & Technical Information Report Number: 1000355
  • Archival Resource Key: ark:/67531/metadc836275

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • June 1, 2010

Added to The UNT Digital Library

  • May 19, 2016, 3:16 p.m.

Description Last Updated

  • Oct. 2, 2017, 5:32 p.m.

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Naulleau, Patrick. Optics, mask and resist implications on contact CDU, article, June 1, 2010; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc836275/: accessed November 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.