The Mechanical Properties of Alumina Films Formed by Plasma Deposition and by Ion Irradiation of Sapphire

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This paper examines the correlation between mechanical properties and the density, phase, and hydrogen content of deposited alumina layers, and compares them to those of sapphire and amorphous alumina synthesized through ion-beam irradiation of sapphire. Alumina films were deposited using electron beam evaporation of aluminum and co-bombardment with O{sub 2}{sup +} ions (30-230 eV) from an electron cyclotron resonance (ECR) plasma. The H content and phase were controlled by varying the deposition temperature and the ion energy. Sapphire was amorphized at 84 K by irradiation with Al and O ions (in stoichiometric ratio) to a defect level of 4 dpa ... continued below

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19 p.

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Barbour, J.C.; Follstaedt, D.M.; Knapp, J.A.; Linam, D.L.; Mayer, T.M. & Minor, K.G. July 16, 1999.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. It has been viewed 13 times , with 6 in the last month . More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

This paper examines the correlation between mechanical properties and the density, phase, and hydrogen content of deposited alumina layers, and compares them to those of sapphire and amorphous alumina synthesized through ion-beam irradiation of sapphire. Alumina films were deposited using electron beam evaporation of aluminum and co-bombardment with O{sub 2}{sup +} ions (30-230 eV) from an electron cyclotron resonance (ECR) plasma. The H content and phase were controlled by varying the deposition temperature and the ion energy. Sapphire was amorphized at 84 K by irradiation with Al and O ions (in stoichiometric ratio) to a defect level of 4 dpa in order to form an amorphous layer 370 nm thick. Nanoindentation was performed to determine the elastic modulus, yield strength and hardness of all materials. Sapphire and amorphized sapphire have a higher density and exhibit superior mechanical properties in comparison to the deposited alumina films. Density was determined to be the primary factor affecting the mechanical properties, which showed only a weak correlation to the hydrogen content.

Physical Description

19 p.

Notes

INIS; OSTI as DE00009017

Medium: P; Size: 19 pages

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  • Journal Name: Nuclear Instruments and Methods and Physics Research; Other Information: Submitted to Nuclear Instruments and Methods and Physics Research

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  • Report No.: SAND99-0563J
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 9017
  • Archival Resource Key: ark:/67531/metadc794647

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • July 16, 1999

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

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  • April 7, 2017, 6:52 p.m.

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Barbour, J.C.; Follstaedt, D.M.; Knapp, J.A.; Linam, D.L.; Mayer, T.M. & Minor, K.G. The Mechanical Properties of Alumina Films Formed by Plasma Deposition and by Ion Irradiation of Sapphire, article, July 16, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc794647/: accessed October 17, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.