Direct current sputtering of boron from boron/carbon mixtures

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Description

A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached and coating the substrate material with boron by sputtering from the boron-containing rod.

Physical Description

11 p.

Creation Information

Timberlake, J.R.; Manos, D. & Nartowitz, E. December 31, 1993.

Context

This patent is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this patent can be viewed below.

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Description

A method for coating a substrate with boron by sputtering includes lowering the electrical resistance of a boron-containing rod to allow electrical conduction in the rod; placing the boron-containing rod inside a vacuum chamber containing substrate material to be coated; applying an electrical potential between the boron target material and the vacuum chamber; countering a current avalanche that commences when the conduction heating rate exceeds the cooling rate, and until a steady equilibrium heating current is reached and coating the substrate material with boron by sputtering from the boron-containing rod.

Physical Description

11 p.

Notes

OSTI as DE95015040

Source

  • Other Information: PBD: 1993

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  • Other: DE95015040
  • Report No.: PATENTS-US--A8067967
  • Grant Number: AC02-76CH03073
  • Office of Scientific & Technical Information Report Number: 87304
  • Archival Resource Key: ark:/67531/metadc794550

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • December 31, 1993

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • Jan. 4, 2016, 1:44 p.m.

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Citations, Rights, Re-Use

Timberlake, J.R.; Manos, D. & Nartowitz, E. Direct current sputtering of boron from boron/carbon mixtures, patent, December 31, 1993; United States. (digital.library.unt.edu/ark:/67531/metadc794550/: accessed October 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.