High-Aspect-Ratio Nanophotonic Components Fabricated by Cl(2) RIBE

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Description

We describe highly anisotropic reactive ion beam etching of nanophotonic structures in AlGaAs based on the ion beam divergence angle and chamber pressure. The divergence angle is shown to influence the shape of the upper portion of the etch while the chamber pressure controls the shape of the lower portion. This predictable region of parameter space resulted in highly anisotropic nanostructures. Deeply etched distributed Bragg reflectors are etched to an aspect ratio of 8:1 with 100 nm trench widths. The profile of the grating etch is straight with smooth sidewalls, flat bottoms, and squared corners. Two-dimensional photonic crystal post arrays ... continued below

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16 p.

Creation Information

Zubrzycki, W.J.; Vawter, G.A. & Wendt, J.R. July 8, 1999.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

We describe highly anisotropic reactive ion beam etching of nanophotonic structures in AlGaAs based on the ion beam divergence angle and chamber pressure. The divergence angle is shown to influence the shape of the upper portion of the etch while the chamber pressure controls the shape of the lower portion. This predictable region of parameter space resulted in highly anisotropic nanostructures. Deeply etched distributed Bragg reflectors are etched to an aspect ratio of 8:1 with 100 nm trench widths. The profile of the grating etch is straight with smooth sidewalls, flat bottoms, and squared corners. Two-dimensional photonic crystal post arrays are fabricated with smooth and vertical sidewalls, with structures as small as 180 nm in diameter and 2.0 {micro}m in height.

Physical Description

16 p.

Notes

OSTI as DE00008798

Medium: P; Size: 16 pages

Source

  • Journal Name: Journal of Vacuum and Science Technology; Other Information: Submitted to Journal of Vacuum and Science Technology

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  • Report No.: SAND99-1745J
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 8798
  • Archival Resource Key: ark:/67531/metadc794304

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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Creation Date

  • July 8, 1999

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • April 7, 2017, 3:17 p.m.

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Zubrzycki, W.J.; Vawter, G.A. & Wendt, J.R. High-Aspect-Ratio Nanophotonic Components Fabricated by Cl(2) RIBE, article, July 8, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc794304/: accessed December 11, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.