Reactive sputter deposition of yttria-stabilized zirconia

PDF Version Also Available for Download.

Description

Yttria-stabilized zirconia (YSZ) films are synthesized using reactive de magnetron sputter deposition. A homogeneous alloy of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-0 films. The sputtering conditions of gas flow, gas pressure, deposition rate and substrate temperature are determined in order to produce the cubic phase of zirconia as verified with x-ray diffraction. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y alloy target is metallic as opposed to oxide. The Zr-Y composition of the planar magnetron target is designed ... continued below

Physical Description

16 p.

Creation Information

Jankowski, A.F. & Hayes, J.P. May 1, 1995.

Context

This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

Who

People and organizations associated with either the creation of this article or its content.

Sponsor

Publisher

Provided By

UNT Libraries Government Documents Department

Serving as both a federal and a state depository library, the UNT Libraries Government Documents Department maintains millions of items in a variety of formats. The department is a member of the FDLP Content Partnerships Program and an Affiliated Archive of the National Archives.

Contact Us

What

Descriptive information to help identify this article. Follow the links below to find similar items on the Digital Library.

Description

Yttria-stabilized zirconia (YSZ) films are synthesized using reactive de magnetron sputter deposition. A homogeneous alloy of Zr-Y is synthesized and processed into a planar magnetron target which is reactively sputtered with an Argon-Oxygen gas mixture to form Zr-Y-0 films. The sputtering conditions of gas flow, gas pressure, deposition rate and substrate temperature are determined in order to produce the cubic phase of zirconia as verified with x-ray diffraction. A higher rate of deposition is achievable when the sputtering mode of the Zr-Y alloy target is metallic as opposed to oxide. The Zr-Y composition of the planar magnetron target is designed for optimium oxygen-ion conductivity in the YSZ films, at elevated temperature for potential use in solid-oxide fuel cells. The oxygen concentration of the as-deposited films is measured using Auger electron spectroscopy and found to principally vary as a function of the sputter deposition rate. A fuel cell is produced with the reactive deposition process using Pt electrodes from which the growth morphology of the YSZ layer is characterized using scanning electron microscopy.

Physical Description

16 p.

Notes

OSTI as DE95015878

Source

  • 22. international AVS conference on metallurgical coatings and thin films (ICMCTF-22), San Diego, CA (United States), 24-28 Apr 1995

Language

Item Type

Identifier

Unique identifying numbers for this article in the Digital Library or other systems.

  • Other: DE95015878
  • Report No.: UCRL-JC--118652
  • Report No.: CONF-950454--7
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 95300
  • Archival Resource Key: ark:/67531/metadc794082

Collections

This article is part of the following collection of related materials.

Office of Scientific & Technical Information Technical Reports

What responsibilities do I have when using this article?

When

Dates and time periods associated with this article.

Creation Date

  • May 1, 1995

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • Feb. 17, 2016, 3:53 p.m.

Usage Statistics

When was this article last used?

Yesterday: 0
Past 30 days: 0
Total Uses: 4

Interact With This Article

Here are some suggestions for what to do next.

Start Reading

PDF Version Also Available for Download.

Citations, Rights, Re-Use

Jankowski, A.F. & Hayes, J.P. Reactive sputter deposition of yttria-stabilized zirconia, article, May 1, 1995; California. (digital.library.unt.edu/ark:/67531/metadc794082/: accessed September 22, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.