W-Coating for MEMS

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Description

The integration of miniaturized mechanical components has spawned a new technology known as microelectromechanical systems (MEMS). Surface micromachining, defined as the fabrication of micromechanical structures from deposited thin films, is one of the core technological processes underlying MEMS. Surface micromachined structures have a large ratio of surface area to volume which makes them particularly vulnerable to adhesion to the substrate or adjacent structures during release or in use--a problem is called stiction. Since microactuators can have surfaces in normal or sliding contact, function and wear are critical issues for reliable operation of MEMS devices. Surface modifications are needed to reduce ... continued below

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8 p.

Creation Information

Fleming, J.G.; Mani, S.S. & Sniegowski, J.J. July 8, 1999.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

The integration of miniaturized mechanical components has spawned a new technology known as microelectromechanical systems (MEMS). Surface micromachining, defined as the fabrication of micromechanical structures from deposited thin films, is one of the core technological processes underlying MEMS. Surface micromachined structures have a large ratio of surface area to volume which makes them particularly vulnerable to adhesion to the substrate or adjacent structures during release or in use--a problem is called stiction. Since microactuators can have surfaces in normal or sliding contact, function and wear are critical issues for reliable operation of MEMS devices. Surface modifications are needed to reduce adhesion and friction in micromechanical structures. In this paper, we will present a process used to selectively coat MEMS devices with Tungsten using a CVD (Chemical Vapor Deposition) process. We will discuss the effect of wet and vapor phase cleans along with different process variables. Endurance of the W coating is important, especially in applications where wear due to repetitive contacts with the film may occur. Further, tungsten is hard and chemically inert, Tungsten CVD is used in the integrated-circuit industry, which makes this, approach manufacturable.

Physical Description

8 p.

Notes

OSTI as DE00008951

Medium: P; Size: 8 pages

Source

  • Micromachining and Microfabrication Process Technology Conference, Santa Clara, CA (US), 09/20/1999--09/22/1999

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  • Report No.: SAND99-1708C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 8951
  • Archival Resource Key: ark:/67531/metadc793571

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • July 8, 1999

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • April 11, 2017, 6:13 p.m.

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Fleming, J.G.; Mani, S.S. & Sniegowski, J.J. W-Coating for MEMS, article, July 8, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc793571/: accessed July 20, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.