Critical illumination condenser for extreme ultraviolet projection lithography

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A condenser system couples a radiation source to an imaging system. The authors have designed a critical illumination condenser system which meets the technical challenges of extreme ultraviolet projection lithography based on a ring field imaging system and a laser produced plasma source. The optical system, a three spherical mirror optical design, is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. This type of condenser optical design is sufficiently versatile to be employed with two distinct systems, one from Lawrence Livermore National Laboratory and one from AT and ... continued below

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9 p.

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Cohen, S.J. & Seppala, L.G. March 2, 1995.

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Description

A condenser system couples a radiation source to an imaging system. The authors have designed a critical illumination condenser system which meets the technical challenges of extreme ultraviolet projection lithography based on a ring field imaging system and a laser produced plasma source. The optical system, a three spherical mirror optical design, is capable of illuminating the extent of the mask plane by scanning either the primary mirror or the laser plasma source. This type of condenser optical design is sufficiently versatile to be employed with two distinct systems, one from Lawrence Livermore National Laboratory and one from AT and T/Sandia.

Physical Description

9 p.

Notes

OSTI as DE95014683

Source

  • Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994

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  • Other: DE95014683
  • Report No.: UCRL-JC--119634
  • Report No.: CONF-9409177--16
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 90214
  • Archival Resource Key: ark:/67531/metadc793427

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Office of Scientific & Technical Information Technical Reports

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  • March 2, 1995

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  • Dec. 19, 2015, 7:14 p.m.

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  • Feb. 23, 2016, 1:23 p.m.

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Cohen, S.J. & Seppala, L.G. Critical illumination condenser for extreme ultraviolet projection lithography, article, March 2, 1995; California. (digital.library.unt.edu/ark:/67531/metadc793427/: accessed November 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.