Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas

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Description

Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers ... continued below

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30 p.

Creation Information

Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C. & Chow, W.W. June 1, 1995.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Laser Plasma Sources (LPSS) of extreme ultraviolet radiation are an attractive alternative to synchrotron radiation sources for extreme ultraviolet lithography (EUVL) due to their modularity, brightness, and modest size and cost. To fully exploit the extreme ultraviolet power emitted by such sources, it is necessary to capture the largest possible fraction of the source emission half-sphere while simultaneously optimizing the illumination stationarity and uniformity on the object mask. In this LDRD project, laser plasma source illumination systems for EUVL have been designed and then theoretically and experimentally characterized. Ellipsoidal condensers have been found to be simple yet extremely efficient condensers for small-field EUVL imaging systems. The effects of aberrations in such condensers on extreme ultraviolet (EUV) imaging have been studied with physical optics modeling. Lastly, the design of an efficient large-solid-angle condenser has been completed. It collects 50% of the available laser plasma source power at 14 nm and delivers it properly to the object mask in a wide-arc-field camera.

Physical Description

30 p.

Notes

INIS; OSTI as DE95014992

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  • Other Information: PBD: Jun 1995

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  • Other: DE95014992
  • Report No.: SAND--95-8229
  • Grant Number: AC04-94AL85000
  • DOI: 10.2172/93460 | External Link
  • Office of Scientific & Technical Information Report Number: 93460
  • Archival Resource Key: ark:/67531/metadc793388

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • June 1, 1995

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

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  • April 14, 2016, 8:36 p.m.

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Kubiak, G.D.; Tichenor, D.A.; Sweatt, W.C. & Chow, W.W. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas, report, June 1, 1995; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc793388/: accessed April 21, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.