LLNL large-area inductively coupled plasma (ICP) source: Experiments

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We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N{sub 2} over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The ... continued below

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6 p.

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Richardson, R.A.; Egan, P.O. & Benjamin, R.D. May 1, 1995.

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Description

We describe initial experiments with a large (76-cm diameter) plasma source chamber to explore the problems associated with large-area inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400-mm semiconductor wafers. Our experiments typically use a 640-nun diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N{sub 2} over the pressure range 3-50 mtorr. RF inductive power was run up to 2000W, but typically data were taken over the range 100-1000W. Diagnostics include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400-mm processing are attainable.

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6 p.

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INIS; OSTI as DE95015895

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  • 12. international symposium on plasma chemistry, Minneapolis, MN (United States), 21-25 Aug 1995

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  • Other: DE95015895
  • Report No.: UCRL-JC--120963
  • Report No.: CONF-950875--5
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 97195
  • Archival Resource Key: ark:/67531/metadc793349

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • May 1, 1995

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  • Dec. 19, 2015, 7:14 p.m.

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  • Feb. 23, 2016, 4:25 p.m.

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Richardson, R.A.; Egan, P.O. & Benjamin, R.D. LLNL large-area inductively coupled plasma (ICP) source: Experiments, article, May 1, 1995; California. (digital.library.unt.edu/ark:/67531/metadc793349/: accessed November 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.