High average power laser for EUV lithography

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Description

We have demonstrated the operation of a high average power, all solid state laser and target system for EUV lithography. The laser operates at 1.06 {mu}m with a pulse repetition rate of 200 Hz. Each pulse contains up to 400 mJ of energy and is less than 10 ns in duration. The ELTV conversion efficiency measured with the laser is independent of the laser repetition rate. Operating at 200 Hz, the laser has been used for lithography using a 3 bounce Kohler illuminator.

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6 p.

Creation Information

Kania, D.R.; Gaines, D.P.; Hermann, M.; Honig, J.; Hostetler, R.; Levesque, R. et al. January 19, 1995.

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Description

We have demonstrated the operation of a high average power, all solid state laser and target system for EUV lithography. The laser operates at 1.06 {mu}m with a pulse repetition rate of 200 Hz. Each pulse contains up to 400 mJ of energy and is less than 10 ns in duration. The ELTV conversion efficiency measured with the laser is independent of the laser repetition rate. Operating at 200 Hz, the laser has been used for lithography using a 3 bounce Kohler illuminator.

Physical Description

6 p.

Notes

OSTI as DE95014689

Source

  • 3. international conference on nucleon-antinucleon physics, Moscow (Russian Federation), 11-16 Sep 1995

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  • Other: DE95014689
  • Report No.: UCRL-JC--119630
  • Report No.: CONF-9509177--12
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 93643
  • Archival Resource Key: ark:/67531/metadc792871

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  • January 19, 1995

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

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  • Feb. 23, 2016, 4:20 p.m.

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Kania, D.R.; Gaines, D.P.; Hermann, M.; Honig, J.; Hostetler, R.; Levesque, R. et al. High average power laser for EUV lithography, article, January 19, 1995; California. (digital.library.unt.edu/ark:/67531/metadc792871/: accessed September 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.