Silicon Nitride Membranes for Filtration and Separation

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Description

Semi-Permeable silicon nitride membranes have been developed using a Bosch etch process followed by a reactive ion etch (NE) process. These membranes were observed to allow air but not water to pass through them into surface micromachined, silicon nitride microfluidic channels. Membranes with this property have potential use in microfluidic systems as gas bubble traps and vents, filters to remove particles and gas partitioning membranes. Membrane permeation was measured as 1.6 x 10{sup {minus}8} mol/m{sup 2}Pa s of helium for inline membranes at the entrance and exit of the silicon nitride microfluidic channels.

Physical Description

11 p.

Creation Information

Galambos, Paul; Zavadil, Kevin; Shul, Randy; Willison, Christi Gober & Miller, Sam July 19, 1999.

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This article is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this article can be viewed below.

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  • Sandia National Laboratories
    Publisher Info: Sandia National Labs., Albuquerque, NM, and Livermore, CA (United States)
    Place of Publication: Albuquerque, New Mexico

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Description

Semi-Permeable silicon nitride membranes have been developed using a Bosch etch process followed by a reactive ion etch (NE) process. These membranes were observed to allow air but not water to pass through them into surface micromachined, silicon nitride microfluidic channels. Membranes with this property have potential use in microfluidic systems as gas bubble traps and vents, filters to remove particles and gas partitioning membranes. Membrane permeation was measured as 1.6 x 10{sup {minus}8} mol/m{sup 2}Pa s of helium for inline membranes at the entrance and exit of the silicon nitride microfluidic channels.

Physical Description

11 p.

Notes

OSTI as DE00009504

Medium: P; Size: 11 pages

Source

  • SPIE's International Symposium on Micromachining and Fabrication, Santa Clara, CA (US), 09/20/1999--09/23/1999

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Identifier

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  • Report No.: SAND99-0422C
  • Grant Number: AC04-94AL85000
  • Office of Scientific & Technical Information Report Number: 9504
  • Archival Resource Key: ark:/67531/metadc792244

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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Creation Date

  • July 19, 1999

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • April 6, 2017, 7:37 p.m.

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Galambos, Paul; Zavadil, Kevin; Shul, Randy; Willison, Christi Gober & Miller, Sam. Silicon Nitride Membranes for Filtration and Separation, article, July 19, 1999; Albuquerque, New Mexico. (digital.library.unt.edu/ark:/67531/metadc792244/: accessed January 23, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.