A joint development project to design a new photolithography steeping machine capable of 150 nanometer overlay accuracy was completed by Ultratech Stepper and the Lawrence Livermore National Laboratory. The principal result of the project is a next-generation product that will strengthen the US position in step-and-repeat photolithography. The significant challenges addressed and solved in the project are the subject of this report. Design methods and new devices that have broader application to precision machine design are presented in greater detail while project specific information serves primarily as background and motivation.
Publisher Info:
Lawrence Livermore National Lab., CA (United States)
Place of Publication:
California
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Description
A joint development project to design a new photolithography steeping machine capable of 150 nanometer overlay accuracy was completed by Ultratech Stepper and the Lawrence Livermore National Laboratory. The principal result of the project is a next-generation product that will strengthen the US position in step-and-repeat photolithography. The significant challenges addressed and solved in the project are the subject of this report. Design methods and new devices that have broader application to precision machine design are presented in greater detail while project specific information serves primarily as background and motivation.
Hale, L.; Klingmann, J. & Markle, D.New photolithography stepping machine,
report,
March 8, 1995;
California.
(digital.library.unt.edu/ark:/67531/metadc792159/:
accessed September 24, 2017),
University of North Texas Libraries, Digital Library, digital.library.unt.edu;
crediting UNT Libraries Government Documents Department.