New photolithography stepping machine

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Description

A joint development project to design a new photolithography steeping machine capable of 150 nanometer overlay accuracy was completed by Ultratech Stepper and the Lawrence Livermore National Laboratory. The principal result of the project is a next-generation product that will strengthen the US position in step-and-repeat photolithography. The significant challenges addressed and solved in the project are the subject of this report. Design methods and new devices that have broader application to precision machine design are presented in greater detail while project specific information serves primarily as background and motivation.

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35 p.

Creation Information

Hale, L.; Klingmann, J. & Markle, D. March 8, 1995.

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This report is part of the collection entitled: Office of Scientific & Technical Information Technical Reports and was provided by UNT Libraries Government Documents Department to Digital Library, a digital repository hosted by the UNT Libraries. More information about this report can be viewed below.

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Description

A joint development project to design a new photolithography steeping machine capable of 150 nanometer overlay accuracy was completed by Ultratech Stepper and the Lawrence Livermore National Laboratory. The principal result of the project is a next-generation product that will strengthen the US position in step-and-repeat photolithography. The significant challenges addressed and solved in the project are the subject of this report. Design methods and new devices that have broader application to precision machine design are presented in greater detail while project specific information serves primarily as background and motivation.

Physical Description

35 p.

Notes

OSTI as DE95015879

Source

  • Other Information: PBD: 8 Mar 1995

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Identifier

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  • Other: DE95015879
  • Report No.: UCRL-ID--120313
  • Grant Number: W-7405-ENG-48
  • DOI: 10.2172/97300 | External Link
  • Office of Scientific & Technical Information Report Number: 97300
  • Archival Resource Key: ark:/67531/metadc792159

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Office of Scientific & Technical Information Technical Reports

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Creation Date

  • March 8, 1995

Added to The UNT Digital Library

  • Dec. 19, 2015, 7:14 p.m.

Description Last Updated

  • Feb. 23, 2016, 5:39 p.m.

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Hale, L.; Klingmann, J. & Markle, D. New photolithography stepping machine, report, March 8, 1995; California. (digital.library.unt.edu/ark:/67531/metadc792159/: accessed September 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.