Evolving bunch and retardation in the impedance formalism

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The usual expression for the longitudinal wake field in terms of the impedance is exact only for the model in which the source of the field is a rigid bunch. To account for a deforming bunch one has to invoke the complete impedance, a function of both wave number and frequency. A computation of the corresponding wake field would be expensive, since it would involve integrals over frequency and time in addition to the usual sum over wave number. We treat the problem of approximating this field in an example of current interest, the case of coherent synchrotron radiation (CSR) ... continued below

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Warnock, Robert & Venturini, Marco May 22, 2003.

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The usual expression for the longitudinal wake field in terms of the impedance is exact only for the model in which the source of the field is a rigid bunch. To account for a deforming bunch one has to invoke the complete impedance, a function of both wave number and frequency. A computation of the corresponding wake field would be expensive, since it would involve integrals over frequency and time in addition to the usual sum over wave number. We treat the problem of approximating this field in an example of current interest, the case of coherent synchrotron radiation (CSR) in the presence of shielding by the vacuum chamber.

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  • 2003 Particle Accelerator Conference, Portlan, OR, May 12/16

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  • Report No.: LBNL--52869
  • Report No.: CBP Note - 604
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 842958
  • Archival Resource Key: ark:/67531/metadc785099

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  • May 22, 2003

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  • Dec. 3, 2015, 9:30 a.m.

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  • Dec. 9, 2016, 11:29 p.m.

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Warnock, Robert & Venturini, Marco. Evolving bunch and retardation in the impedance formalism, article, May 22, 2003; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc785099/: accessed June 20, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.