The advantages of evaporation of Hafnium in a reactive environment to manufacture high damage threshold multilayer coatings by electron-beam deposition

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Bevis, R P; Sheehan, L M; Smith, D J; Stolz, C J & Von Gunten, M K April 22, 1999.

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  • European Optical Society Symposium on Optical Systems Design and Production, Berlin (DE), 05/25/1999--05/28/1999

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  • Report No.: UCRL-JC-132251
  • Report No.: DP0213000
  • Grant Number: W-7405-ENG-48
  • Office of Scientific & Technical Information Report Number: 8557
  • Archival Resource Key: ark:/67531/metadc781170

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  • April 22, 1999

Added to The UNT Digital Library

  • Dec. 3, 2015, 9:30 a.m.

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  • May 5, 2016, 9:01 p.m.

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Bevis, R P; Sheehan, L M; Smith, D J; Stolz, C J & Von Gunten, M K. The advantages of evaporation of Hafnium in a reactive environment to manufacture high damage threshold multilayer coatings by electron-beam deposition, article, April 22, 1999; California. (digital.library.unt.edu/ark:/67531/metadc781170/: accessed September 20, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.