Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks

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Description

A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 {micro}m ... continued below

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3232 Kilobytes pages

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Spector, S.J.; Astolfi, D.K.; Doran, S.P.; Lyszczarz, T.M. & Raynolds, J.E. June 15, 2001.

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  • Lockheed Martin
    Publisher Info: Lockheed Martin Corporation, Schenectady, NY 12301 (United States)
    Place of Publication: Schenectady, New York

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Description

A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 {micro}m and reflect wavelengths outside of this pass-band. The FSSs fabricated performed as expected with a pass-band centered near 5 {micro}m.

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3232 Kilobytes pages

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OSTI as DE00821683

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  • Other Information: PBD: 15 Jun 2001

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  • Report No.: LM-01K062
  • Grant Number: AC12-00SN39357
  • DOI: 10.2172/821683 | External Link
  • Office of Scientific & Technical Information Report Number: 821683
  • Archival Resource Key: ark:/67531/metadc779378

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Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

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  • June 15, 2001

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  • Dec. 3, 2015, 9:30 a.m.

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  • April 28, 2016, 8:51 p.m.

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Spector, S.J.; Astolfi, D.K.; Doran, S.P.; Lyszczarz, T.M. & Raynolds, J.E. Infrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks, report, June 15, 2001; Schenectady, New York. (digital.library.unt.edu/ark:/67531/metadc779378/: accessed November 24, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.