EUV Engineering Test Stand

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The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging system and stages from the illumination system. Environmental conditions can be controlled independently in the two modules to maximize EUV throughput and environmental control. A source of 13.4 nm radiation is provided by a laser plasma source in which a YAG laser beam is focused onto a xenon-cluster target. A condenser system, comprised of multilayer-coated mirrors and grazing-incidence mirrors, collects the EUV ... continued below

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2,300 Kilobytes pages

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Tichenor, D. A.; Kubiak, G. D.; Replogle, W. C.; Klebanoff, L. E.; Wronosky, J. B.; Hale, L. C. et al. February 14, 2000.

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Description

The Engineering Test Stand (ETS) is an EUV laboratory lithography tool. The purpose of the ETS is to demonstrate EUV full-field imaging and provide data required to support production-tool development. The ETS is configured to separate the imaging system and stages from the illumination system. Environmental conditions can be controlled independently in the two modules to maximize EUV throughput and environmental control. A source of 13.4 nm radiation is provided by a laser plasma source in which a YAG laser beam is focused onto a xenon-cluster target. A condenser system, comprised of multilayer-coated mirrors and grazing-incidence mirrors, collects the EUV radiation and directs it onto a-reflecting reticle. A four-mirror, ring-field optical system, having a numerical aperture of 0.1, projects a 4x-reduction image onto the wafer plane. This design corresponds to a resolution of 70nm at a k{sub 1} of 0.52. The ETS is designed to produce full-field images in step: and-scan mode using vacuum-compatible, one-dimension-long-travel magnetically levitated stages for both reticle and wafer. Reticle protection is incorporated into the ETS design. This paper provides a system overview of the ETS design and specifications.

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2,300 Kilobytes pages

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  • SPIE 25th International Symposium on Microlithography, Santa Clara, CA (US), 02/27/2000--03/03/2000

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  • Report No.: UCRL-JC-137668
  • Grant Number: W-7405-Eng-48
  • Office of Scientific & Technical Information Report Number: 792716
  • Archival Resource Key: ark:/67531/metadc741433

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Office of Scientific & Technical Information Technical Reports

Reports, articles and other documents harvested from the Office of Scientific and Technical Information.

Office of Scientific and Technical Information (OSTI) is the Department of Energy (DOE) office that collects, preserves, and disseminates DOE-sponsored research and development (R&D) results that are the outcomes of R&D projects or other funded activities at DOE labs and facilities nationwide and grantees at universities and other institutions.

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  • February 14, 2000

Added to The UNT Digital Library

  • Oct. 19, 2015, 7:39 p.m.

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  • May 6, 2016, 1:18 p.m.

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Tichenor, D. A.; Kubiak, G. D.; Replogle, W. C.; Klebanoff, L. E.; Wronosky, J. B.; Hale, L. C. et al. EUV Engineering Test Stand, article, February 14, 2000; California. (digital.library.unt.edu/ark:/67531/metadc741433/: accessed October 20, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.