System integration and performance of the EUV engineering test stand

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Description

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k{sub 1} of 0.52. The illuminator produces 13.4 nm ... continued below

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19 pages

Creation Information

Tichenor, Daniel A.; Ray-Chaudhuri, Avijit K.; Replogle, William C.; Stulen, Richard H.; Kubiak, Glenn D.; Rockett, Paul D. et al. March 1, 2001.

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Description

The Engineering Test Stand (ETS) is a developmental lithography tool designed to demonstrate full-field EUV imaging and provide data for commercial-tool development. In the first phase of integration, currently in progress, the ETS is configured using a developmental projection system, while fabrication of an improved projection system proceeds in parallel. The optics in the second projection system have been fabricated to tighter specifications for improved resolution and reduced flare. The projection system is a 4-mirror, 4x-reduction, ring-field design having a numeral aperture of 0.1, which supports 70 nm resolution at a k{sub 1} of 0.52. The illuminator produces 13.4 nm radiation from a laser-produced plasma, directs the radiation onto an arc-shaped field of view, and provides an effective fill factor at the pupil plane of 0.7. The ETS is designed for full-field images in step-and-scan mode using vacuum-compatible, magnetically levitated, scanning stages. This paper describes system performance observed during the first phase of integration, including static resist images of 100 nm isolated and dense features.

Physical Description

19 pages

Notes

INIS; OSTI as DE00796103

Source

  • 26th Annual International Symposium on Microlithography, Santa Clara, CA (US), 02/25/2001--03/02/2001

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  • Report No.: LBNL--50208
  • Report No.: LBNL/ALS--13669
  • Grant Number: AC03-76SF00098
  • Office of Scientific & Technical Information Report Number: 796103
  • Archival Resource Key: ark:/67531/metadc741028

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  • March 1, 2001

Added to The UNT Digital Library

  • Oct. 19, 2015, 7:39 p.m.

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  • April 4, 2016, 3:50 p.m.

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Tichenor, Daniel A.; Ray-Chaudhuri, Avijit K.; Replogle, William C.; Stulen, Richard H.; Kubiak, Glenn D.; Rockett, Paul D. et al. System integration and performance of the EUV engineering test stand, article, March 1, 2001; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc741028/: accessed August 23, 2017), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.