The influence of sub-100 nm scattering on high-energy electron beam lithography Page: 16 of 21
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1500 2000 2500
(Dot Radius)2 [m2]
p= 26 m
-m Short Range Scattering
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Anderson, Erik H.; Olynick, Deidre L.; Chao, Weilun; Harteneck, Bruce & Veklerov, Eugene. The influence of sub-100 nm scattering on high-energy electron beam lithography, article, August 1, 2001; Berkeley, California. (digital.library.unt.edu/ark:/67531/metadc740262/m1/16/: accessed September 24, 2018), University of North Texas Libraries, Digital Library, digital.library.unt.edu; crediting UNT Libraries Government Documents Department.